High-repetition laser system for generating ultra-short pulses according to the principle of cavity dumping
US7907644B2 · kind B2 · utility
2Cited by
10References
22Claims
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Key dates
| Filing date | Dec 10, 2004 |
| Grant date | Mar 15, 2011 |
| Priority date | — |
| Expiry date | Dec 24, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S2301/085
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high-repetition laser system for generating ultra-short pulses according to the principle of pulse decoupling is described. This is achieved by the use of an amplifying laser medium, a laser resonator with at least one resonator mirror and at least one pulse decoupling component, a saturable absorber mirror, and a pump source for pumping the laser medium wherein the pulse decoupling component is an electro-optical modulator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.