Plasma sensors and related methods
US7908115B2 · kind B2 · utility
2Cited by
8References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2008 |
| Grant date | Mar 15, 2011 |
| Priority date | — |
| Expiry date | Jan 26, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F15/046
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Plasma sensors, systems and related methods are described. An example method for predicting an event includes providing a carrier signal across two electrodes and forming a plasma between the two electrodes. The example method also includes measuring a modulated signal from the plasma, manipulating the modulated signal to produce a value and comparing the value to a threshold. Finally, the example method includes determining the likelihood of the event based on the comparison.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.