Patent · US Active

Process reflection

US7908521B2 · kind B2 · utility

107Cited by
11References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 25, 2008
Grant dateMar 15, 2011
Priority date
Expiry dateJul 9, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F11/0766
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Process reflection techniques are described in which a reflected process is created to facilitate analysis of a process. Events are detected to initiate reflection of a target process. Process reflection of a target process may be initiated by an external process or by the target process itself. A reflected process of the target process is created. In an implementation, data defining the target process is replicated, copied, or otherwise collected from the target process to create the reflected process. Then, analysis may be performed on the reflected process while execution of the target process continues.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.