Mask, mask manufacturing method, film forming method, electro-optic device manufacturing method, and electronic apparatus
US7909932B2 · kind B2 · utility
3Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2006 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | Aug 4, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask includes: a base plate having an opening; a chip having an aperture pattern positioned at the opening in the base plate; a plug detachably arranged to the base plate; and a joining member joining the chip and the plug.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.