Patent · US Active

Method of producing a layer arrangement, method of producing an electrical component, layer arrangement, and electrical component

US7910210B2 · kind B2 · utility

3Cited by

4References

22Claims

0Family size

Assignee

Rising Silicon, Inc. · US

Inventors

Franz Kreupl · Mountain View, US
Maik Liebau · Dresden, DE
Georg Duesberg · Blackrock, IE
Christian Kapteyn · Dresden, DE

Key dates

Filing date	Nov 20, 2006
Grant date	Mar 22, 2011
Priority date	—
Expiry date	Feb 27, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/30
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

In a method of producing a layer arrangement, a substantially carbon-comprising, electrically conductive carbon layer is formed. A protective layer is formed on the carbon layer. An electrically insulating layer is formed on the protective layer, the protective layer protecting the carbon layer from damage during the formation of the electrically insulating layer. Furthermore, a layer arrangement is provided, having a substantially carbon-comprising, electrically conductive carbon layer, a protective layer formed on the carbon layer, and an electrically insulating layer formed on the protective layer, the protective layer being used to avoid damage to the carbon layer by the electrically insulating layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.