Method and system for providing optical proximity correction for structures such as a PMR nose
US7910267B1 · kind B1 · utility
153Cited by
13References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2008 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | May 18, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical mask for providing a pattern for portion of an electronic device, such as a magnetic recording transducer, is disclosed. The optical mask includes a device feature and at least one detached correction feature. The device feature includes a corner corresponding to a device corner of the pattern. The device corner has an angle of greater than zero degrees and less than one hundred eighty degrees. The at least one detached correction feature resides in proximity to but is physically separated from the corner. Each of the at least one detached correction feature is sub-resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.