Methods for forming a dual-doped emitter on a silicon substrate with a sub-critical shear thinning nanoparticle fluid

US7910393B2 · kind B2 · utility

Assignee

• Innovalight, Inc. · US

Inventors

• Hyungrak Kim · Saratoga, US
• Malcolm Abbott · Sunnyvale, US
• Andreas Meisel · San Francisco, US
• Elizabeth Tai · Cupertino, US
• Augustus Jones · Sunnyvale, US
• Dmitry Poplavskyy · San Jose, US
• Karel Vanheusden · Albuquerque, US

Key dates

• Filing date: Jun 29, 2009
• Grant date: Mar 22, 2011
• Expiry date: Jun 29, 2029

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02658
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A Group IV based nanoparticle fluid is disclosed. The nanoparticle fluid includes a set of nanoparticles—comprising a set of Group IV atoms, wherein the set of nanoparticles is present in an amount of between about 1 wt % and about 20 wt % of the nanoparticle fluid. The nanoparticle fluid also includes a set of HMW molecules, wherein the set of HMW molecules is present in an amount of between about 0 wt % and about 5 wt % of the nanoparticle fluid. The nanoparticle fluid further includes a set of capping agent molecules, wherein at least some capping agent molecules of the set of capping agent molecules are attached to the set of nanoparticles.