Electron emission thin-film, plasma display panel and methods for manufacturing
US7911142B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 2006 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | Mar 5, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J11/12
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Disclosed are an electron emission thin-film with improved secondary electron emission characteristics compared with conventional ones, a plasma display panel including the electron emission thin-film, and their manufacturing methods. Using a vacuum deposition system, a protective layer that is an MgO thin-film is formed on a dielectric layer formed on a front glass substrate. At the time of deposition, angles that lines linking the central point of a target material for the protective layer respectively with the central point and both ends points of the front glass substrate form with the front glass substrate are exclusively in a range of 30 to 80°. This enables at least some of MgO columnar crystals constituting the protective layer to have flat planes that are inclined with respect to the surface of the thin-film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.