Electrochromic devices and methods for patterning such devices
US7911674B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 2008 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | Sep 11, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/153
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Varying the optical absorption of an electrochromic device in situ allows optimal control over the depth and quality of laser patterning lines when patterning electrochromic devices. Accordingly, an electrochromic device comprises a target conductive layer, an absorbing electrochromic layer formed below the target layer, and an electrolyte layer formed below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in a darkened state, and the target layer is laser ablated using a wavelength that is minimally absorbed in the target layer and a fluence level that does not ablate layers of the electrochromic device that are below the absorbing electrochromic layer. The absorbing electrochromic layer is placed in the darkened state by applying a predetermined control voltage to the electrochromic device, forming the electrochromic device by dark-state deposition, or forming an electrochromic device that is in its darkened state in an equilibrium state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.