Determining distortion measures in a pattern recognition process
US7912715B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 27, 2003 |
| Grant date | Mar 22, 2011 |
| Priority date | — |
| Expiry date | Apr 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2218/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining a set of distortion measures in a pattern recognition process, where a sequence of feature vectors is formed from a digitized incoming signal to be recognized, said pattern recognition being based upon said set of distortion measures. The method comprises comparing (S10) a first feature vector in said sequence with a first number (M1) of templates from a set of templates representing candidate patterns, based on said comparison, selecting (S12) a second number (M2) of templates from said template set, the second number being smaller than the first number, and comparing (S14) a second feature vector only with said selected templates. The method can be implemented in a device for pattern recognition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.