Patent · US Active

Method for producing nanostructures on a substrate

US7914850B2 · kind B2 · utility

2Cited by
1References
6Claims
0Family size

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Key dates

Filing dateNov 24, 2006
Grant dateMar 29, 2011
Priority date
Expiry dateMay 8, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/29
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for producing nanostructures on a substrate, by dripping a solution of nanostructure-forming material in water onto the substrate heated to a temperature above the temperature at which a drop of the solution is initially suspended on a vapor cushion after being applied by dripping onto the substrate, with nanostructures being formed when the drops evaporate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.