Patent · US Active

Modified polymers and their use in the production of lithographic printing plate precursors

US7914966B2 · kind B2 · utility

1Cited by

6References

13Claims

0Family size

Assignee

EASTMAN KODAK COMPANY · US

Inventors

Celin Savariar-Hauck · Badenhausen, DE
Alan Monk · Warrington, GB
Rene Ullrich · Zittau, DE

Key dates

Filing date	Jun 15, 2005
Grant date	Mar 29, 2011
Priority date	—
Expiry date	Jun 1, 2027

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB41C2210/262
WIPO fieldTextile and paper machines
WIPO sectorMechanical engineering

Abstract

Radiation-sensitive negative working element comprising (a) a substrate with a hydrophilic surface and (b) a layer on the hydrophilic surface of the substrate, wherein said layer comprises a modified polymer obtainable by reacting (i) a polymer with —COOH, —SO3H, —P03H2 and/or —PO4H2 in the side chains, wherein the polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, and (ii) a salt with an inorganic or organic cation, wherein the modified polymer is soluble in aqueous alkaline solutions and the solubility is not changed by IR radiation, said layer being soluble in aqueous alkaline developer, but is rendered insoluble in aqueous alkaline developer by IR radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.