Patent · US Active

Dispersion of high surface area silica

US7918933B2 · kind B2 · utility

0Cited by

1References

11Claims

0Family size

Assignee

EVONIK DEGUSSA GMBH · DE

Inventors

Wolfgang Lortz · Wächtersbach, DE
Gabriele Perlet · Großkrotzenburg, DE
Werner Will · Gelnhausen, DE
Kai Schumacher · Hofheim, DE

Key dates

Filing date	Aug 28, 2007
Grant date	Apr 5, 2011
Priority date	—
Expiry date	Aug 28, 2027

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08K3/22
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

Dispersion comprising water and mixed potassium silicon oxide powder, where—the mixed oxide powder is in the form of aggregates of primary particles, has a BET surface area of 100 to 400 m2/g, has an average aggregate diameter in the dispersion of less than 100 nm, and possesses a potassium fraction of 0.05% to 1.5% by weight, calculated as K2O and based on the mixed oxide powder, and—the dispersion has a fraction of mixed oxide powder in the dispersion of 25% to 40% by weight, the sum of water and mixed oxide powder is at least 98% by weight and the pH is 9 to 11.5.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.