Plasma generating nozzle having impedance control mechanism
US7921804B2 · kind B2 · utility
Assignees
Inventor
Key dates
| Filing date | Dec 8, 2008 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Jul 2, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/463
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and an impedance controlling structure which adjusts the impedance of the nozzle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.