Patent · US Active

Plasma generating electrode and plasma reactor

US7922978B2 · kind B2 · utility

0Cited by
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13Claims
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Key dates

Filing dateDec 22, 2005
Grant dateApr 12, 2011
Priority date
Expiry dateJan 3, 2029

Classification

  • Technology area (CPC F)Mechanical Engineering; Lighting; Heating
  • CPC primaryF23J2900/15001
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A plasma generating electrode includes two types of plate-shaped unit electrodes of different polarities, the two types of unit electrodes of different polarities being hierarchically and alternately stacked at specific intervals, a discharge space for generating plasma being formed between the opposing unit electrodes, each of the unit electrodes of one polarity among the two types of unit electrodes of different polarities including a plate-shaped conductor exhibiting conductivity and a ceramic dielectric disposed to cover the conductor, the ceramic dielectric of the unit electrode of one polarity including a support protrusion for forming the discharge space for generating plasma between the opposing unit electrodes and at least a part of a space in which the unit electrode of the other polarity is disposed opposite to the unit electrode of one polarity and for supporting the unit electrode of one polarity, the support protrusion being integrally formed with the ceramic dielectric on at least one surface of the ceramic dielectric on at least one end of the ceramic dielectric in one direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.