Silent discharge plasma apparatus
US7922979B2 · kind B2 · utility
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3References
18Claims
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Assignee
Inventors
Key dates
| Filing date | Mar 16, 2006 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Nov 14, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2437
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A silent discharge plasma apparatus includes a dielectric member, a pair of electrodes opposed to each other across the dielectric member and an alternating-current source applying an alternating-current voltage between the electrodes and causing a discharge. A gas is supplied to a discharge space, where discharge occurs, and a plasma is produced. At least one of the electrodes includes a conductive power feeding thin film on the dielectric member. When the dielectric member is destroyed and an arc discharge develops between the electrodes, the power feeding thin film is eliminated or oxidized, and the arc discharge is stopped.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.