Photolithographic patterning of polymeric materials
US7923071B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2006 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Sep 8, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31507
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.