Composition for coating over a photoresist pattern comprising a lactam
US7923200B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 2007 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Jul 5, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D139/00
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1)where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), represents the attachment to the polymer, m=1-6, and n=1-4.The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.