Patent · US Active

Alignment mark of mask

US7927768B2 · kind B2 · utility

1Cited by

0References

20Claims

0Family size

Assignee

VISERA TECHNOLOGIES COMPANY LIMITED · TW

Inventors

Chih-Shen Fan · Dashulong, TW
Li-Wei Chen · Jinshanmian, TW
I-Chin Sung · Tainan, TW
Fa-Cheng Wang · Taipei, TW

Key dates

Filing date	Oct 2, 2008
Grant date	Apr 19, 2011
Priority date	—
Expiry date	Jul 9, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F9/7076
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography mask is disclosed, comprising an alignment mark, including a first bar, a second bar crossing the first bar, and a specific pattern having different signatures with the first and second bars connecting to the second bar.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.