Photoresist composition and method of manufacturing array substrate using the same
US7927897B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Dec 3, 2008 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Jul 13, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.