Cleaning of photolithography masks
US7927969B2 · kind B2 · utility
2Cited by
5References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 7, 2007 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Dec 5, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/0071
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.