Synthetic silica material with low fluence-dependent-transmission and method of making the same
US7928026B2 · kind B2 · utility
7Cited by
9References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 28, 2005 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Dec 16, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2201/54
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.