Device for gaseous plasma sterilization
US7928339B2 · kind B2 · utility
2Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2005 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Jan 15, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H2245/36
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A device for producing a gas plasma by ionisation of a gas using a microwave source of determined nominal power (Pn), includes a magnetron 7 receiving its electric energy from a supply circuit. The device is characterized in that the power (Pd) delivered by the supply circuit to the magnetron 7 is no more than one quarter of the nominal power (Pn) of the magnetron 7.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.