Patent · US Active

Projection objective and projection exposure apparatus for microlithography

US7929115B2 · kind B2 · utility

5Cited by
6References
31Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 29, 2008
Grant dateApr 19, 2011
Priority date—
Expiry dateAug 4, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70891
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Projection objective, projection exposure apparatuses and related systems and components are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.