Patent · US Active

Sodium salt containing CIG targets, methods of making and methods of use thereof

US7935558B1 · kind B1 · utility

13Cited by
50References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 19, 2010
Grant dateMay 3, 2011
Priority date—
Expiry dateOct 19, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A sputtering target includes at least one metal selected from copper, indium and gallium and a sodium containing compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.