Lithographically controlled curvature for MEMS devices and antennas
US7936240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2008 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Aug 13, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01Q9/42
- WIPO fieldTelecommunications
- WIPO sectorElectrical engineering
Abstract
Lithographically fabricated apparatus are provided. The apparatus are capable of self-assembly to extend at least in part in an out-of-plane direction. A cantilever arm is anchored to a substrate at one of its ends and fabricated to provide a cantilever portion that extends from the anchor in a longitudinal direction generally parallel to the substrate, One or more posts are fabricated atop the cantilever portion. The posts shrink from a first volume to a second volume, less than the first volume, during fabrication thereof. The change in volume of the post from the first volume to the second volume causes stress between the post and the cantilever arm resulting in the cantilever portion bending from an in-plane orientation extending in the longitudinal direction to a self-assembled orientation extending at least in part in an out-of-plane direction away from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.