Method and device for characterizing, using active pyrometry, a thin-layer material arranged on a substrate
US7937240B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 15, 2007 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Jan 1, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N25/18
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to a method for characterizing a material using active pyrometry. The material comprises at least one thin surface layer arranged on a thick substrate. The present invention heats the surface (ZTH) of the material by exposing the material to high-frequency laser pulses, so as to perform a series of temperature increase/decrease thermal cycles, accompanied by a heat build-up from one cycle to the next. The present invention collects the emitted radiation, acquires and processes the signals measured by comparing the measured values to the theoretical values obtained by modelling, so as to obtain thermo-physical properties for characterizing the material. The present invention also relates to a device for implementing the method comprising a high-frequency pulsed laser used as heat source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.