Method of fabricating mirrors for liquid crystal on silicon display device
US7938979B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2007 |
| Grant date | May 10, 2011 |
| Priority date | — |
| Expiry date | Jul 16, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136277
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention discloses a method of fabricating mirrors for LCOS (Liquid Crystal On Silicon) display device, including: forming a dielectric layer over a silicon substrate; forming a stop layer over the dielectric layer; forming an insulation layer over the stop layer; etching the insulation layer and the stop layer until the dielectric layer is exposed, thus forming an insulation fence; forming a metal layer over the dielectric layer and the insulation fence; and planarizing the metal layer and the insulation fence, hence the planarized insulation fence isolating the metal layer into mirror array. Therefore no pits can be generated in the metal layer and no pits can be generated in the mirrors formed subsequently, resulting in high quality mirror surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.