Chemical etching composition for the preparation of 3-D nano-structures

US7938980B2 · kind B2 · utility

Assignee

• Forschungszentrum Karlsruhe GmbH · DE

Inventors

• Sean Wong · Karlsruhe, DE
• Georg von Freymann · Toronto, CA
• Martin Wegener · Tauberbischofsheim, DE
• Geoffrey Alan Ozin · Toronto, CA

Key dates

• Filing date: Oct 26, 2007
• Grant date: May 10, 2011
• Expiry date: Jan 11, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B6/1225
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.