Patent · US Active

Mask with registration marks and method of fabricating integrated circuits

US7939224B2 · kind B2 · utility

0Cited by

4References

24Claims

0Family size

Assignee

Qimonda AG · DE

Inventors

Andreas Jahnke · Munich, DE
Ralf Ziebold · Radebeul, DE
Torsten Maehr · Dresden, DE

Key dates

Filing date	Sep 14, 2007
Grant date	May 10, 2011
Priority date	—
Expiry date	Aug 12, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/44
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A photomask for a lithography apparatus includes a chip pattern configured to be transferred into a resist layer on a workpiece and at least one registration mark that is configured not to be transferred into the resist layer. Mask qualification may be improved without impacting wafer level processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.