Patent · US Active

Method and device for vacuum-coating a substrate

US7942111B2 · kind B2 · utility

9Cited by

22References

3Claims

0Family size

Assignee

Robert Bosch GmbH · DE

Inventors

Kurt Burger · Friolzheim, DE
Thomas Weber · Eschborn, DE
Johannes Voigt · Leonberg, DE
Susanne Lucas · Stuttgart, DE

Key dates

Filing date	Dec 9, 2004
Grant date	May 17, 2011
Priority date	—
Expiry date	Dec 7, 2028

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T428/30
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method is proposed for vacuum-coating a substrate using a plasma-CVD method. In order to control ion bombardment during the vacuum coating, a substrate voltage, produced independently from a coating plasma, is applied to the substrate. The substrate voltage is modified during the coating. The substrate voltage is a direct voltage that is pulsed in bipolar fashion with a frequency of 0.1 kHz to 10 MHz. A wear-resistant and friction-reducing multilayer structure of alternating hard material individual layers and carbon or silicon individual layers is proposed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.