Method for operating a pulsed arc evaporation source and vacuum process system comprising said pulsed arc evaporation source
US7943017B2 · kind B2 · utility
8Cited by
4References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 1, 2006 |
| Grant date | May 17, 2011 |
| Priority date | — |
| Expiry date | Aug 27, 2028 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF05D2230/313
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.