Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers

US7943567B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Janet Boggs · Brownsburg, US
• Stephan Brandstadter · Philadelphia, US
• John Chien · West Lafayette, US
• Vimal Sharma · Camden, US
• E. Bradley Edwards · Lafayette, US
• Vicki Hedrick · Brookston, US
• Andrew Jackson · Newark, US
• Gregory Leman · Savoy, US
• Edward C. Norman · Chester Springs, US
• Robert J. Kaufman · University City, US

Key dates

• Filing date: Jan 28, 2005
• Grant date: May 17, 2011
• Expiry date: May 5, 2027

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D3/0094
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.