Semiconductor resistor, method of manufacturing the same, and current generating device using the same
US7944000B2 · kind B2 · utility
5Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2007 |
| Grant date | May 17, 2011 |
| Priority date | — |
| Expiry date | Aug 14, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/47
Abstract
A method for manufacturing a semiconductor resistor includes forming a well region in a semiconductor substrate, with the well region serving as a resistive region, forming a pair of contact regions spaced apart from each other in the well region, and forming a diffusion region in an intermediate portion between the pair of contact regions on a surface of the well region. The diffusion region is configured to adjust resistance and temperature dependence of the semiconductor resistor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.