Mask pattern data generating method, information processing apparatus, photomask fabrication system, and image sensing apparatus
US7945873B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 14, 2008 |
| Grant date | May 17, 2011 |
| Priority date | — |
| Expiry date | Aug 12, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of generating mask pattern data of a photomask used to form microlenses divides a pattern formation surface of a mask pattern to be used for the photomask into a plurality of grid cells, acquires data that represent a transmitted light distribution of the mask pattern to be used for the photomask, determines whether to place a shield on each of the plurality of grid cells by binarizing the plurality of grid cells in order of increasing or decreasing distance from a center of the pattern formation surface using an error diffusion method, to acquire the transmitted light distribution, and generates mask pattern data that represent an arrangement of the shields, based on the determination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.