Method for producing dielectric layer for plasma display panel
US7946898B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 12, 2009 |
| Grant date | May 24, 2011 |
| Priority date | — |
| Expiry date | Jan 5, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J11/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for producing a plasma display panel, a formation of the front-sided dielectric layer comprising the steps of: (i) locally supplying a low-melting point frit material onto a predetermined region of the substrate having the electrode thereon to locally form a low-melting point frit material layer; (ii) heating the low-melting point frit material layer to form a local glass layer therefrom; (iii) supplying a dielectric material over the substrate, covering the electrode and the local glass layer therewith to form a dielectric material layer; and, (iv) heating the dielectric material layer to form a dielectric layer therefrom, wherein a softening temperature of the local glass layer is lower than and equal to a softening temperature of a sealing material to be used for a panel sealing by which the front panel is sealed with a rear panel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.