Cluster generator
US7951276B2 · kind B2 · utility
2Cited by
11References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2007 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Mar 18, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H3/02
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Described herein is an apparatus and a method for producing atom clusters based on a gas discharge within a hollow cathode. The hollow cathode includes one or more walls. The one or more walls define a sputtering chamber within the hollow cathode and include a material to be sputtered. A hollow anode is positioned at an end of the sputtering chamber, and atom clusters are formed when a gas discharge is generated between the hollow anode and the hollow cathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.