Optical device and method of making
US7951632B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 26, 2006 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Feb 8, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02678
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical device and method is disclosed for forming the optical device within the wide-bandgap semiconductor substrate. The optical device is formed by directing a thermal energy beam onto a selected portion of the wide-bandgap semiconductor substrate for changing an optical property of the selected portion to form the optical device in the wide-bandgap semiconductor substrate. The thermal energy beam defines the optical and physical properties of the optical device. The optical device may take the form of an electro-optical device with the addition of electrodes located on the wide-bandgap semiconductor substrate in proximity to the optical device for changing the optical property of the optical device upon a change of a voltage applied to the optional electrodes. The invention is also incorporated into a method of using the optical device for remotely sensing temperature, pressure and/or chemical composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.