Method for fabricating micro-electro-mechanical system (MEMS) device
US7951636B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2008 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Sep 22, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D48/50
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A micro-electro-mechanical system (MEMS) device includes a substrate, having a first side and second side, the second side has a cavity and a plurality of venting holes in the substrate at the second side with connection to the cavity. However, the cavity is included in option without absolute need. A structural dielectric layer has a dielectric structure and a conductive structure in the dielectric structure. The structural dielectric layer has a chamber in connection to the cavity by the venting holes. A suspension structure layer is formed above the chamber. An end portion is formed in the structural dielectric layer in fix position. A diaphragm has a first portion of the diaphragm fixed on the suspension structure layer while a second portion of the diaphragm is free without being fixed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.