Photopolymer composition suitable for lithographic printing plates

US7955776B2 · kind B2 · utility

Assignee

• EASTMAN KODAK COMPANY · US

Inventors

• Harald Baumann · Tuttlingen, DE
• Bernd Strehmel · Berlin, DE
• Detlef Pietsch · Badenhausen, DE
• Udo Dwars · Herzberg, DE
• Tanja Ebhardt · Osterode, DE
• Axel Draber · Osterode, DE

Key dates

• Filing date: Jul 3, 2006
• Grant date: Jun 7, 2011
• Expiry date: Jan 24, 2028

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B41M2205/40
• WIPO field: Textile and paper machines
• WIPO sector: Mechanical engineering

Abstract

Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).