Plasma display panel manufacturing method
US7955787B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 23, 2004 |
| Grant date | Jun 7, 2011 |
| Priority date | — |
| Expiry date | Aug 26, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2217/49207
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of manufacturing a PDP that prevents defects due to dust adhering to a photomask, for example, from occurring in a structure of the PDP. In photolithography, exposure is performed twice in a same process, and photomask (22) is moved within an allowable range of displacement in an exposure pattern, between a first and a second exposures. Photomask (22) is exposed twice in total before and after moving photomask (22). Region (21a), an unexposed region due to interruption of dust (22b) attached to photomask (22), can be suppressed, enabling pattern exposure on photosensitive Ag paste film (21) to be favorably performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.