Patent · US Active

Method for positioning and/or guiding at least one arbitrary process head for the metalization of thin substrates at a defined distance above the substrate surface

US7957829B2 · kind B2 · utility

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20Claims
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Assignee

Inventors

Key dates

Filing dateDec 17, 2008
Grant dateJun 7, 2011
Priority date
Expiry dateJul 26, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/1241
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

A method for positioning or guiding at least one arbitrary print head or a printing unit having at least one pressure nozzle for the imprinting of thin substrates such as wafers at a defined distance above the surface of the substrate, which is to be provided on a support like a paddle or printing table. Distance sensors continuously acquired distance measurements to the surface of the substrate which is to be imprinted. An adjustment of the print head up to 6 degrees of freedom is ensured by actuators in such a manner that the section of the opening of the pressure nozzle of the print head can be adjusted so as to be coplanar to the section of the surface of the substrate which is to be imprinted. The print head is thus maintained or readjusted so as to adjust the section of the opening of the pressure nozzle of the print head to the surface of the substrate which is to be positioned on the support table so as to be coplanar and so as to maintain the coplanar position during the printing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.