Positioning pattern
US7957931B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2006 |
| Grant date | Jun 7, 2011 |
| Priority date | — |
| Expiry date | Aug 26, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D2205/90
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An absolute position detection device, system and method using a pattern comprising two types of position data: location of the pattern relative an object and position of the pattern relative a sensing device, e.g. a camera. The device comprise the sensing device acquiring images of the pattern located on the object and a computational unit analysing the images for determining absolute position of the object relative the sensing device. The present invention is realized in a number of applications, such as forming part of a torque sensor, a theodolite, an articulating arm, or an angular detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.