Patent · US Active

Functionalized photoreactive compounds

US7959990B2 · kind B2 · utility

17Cited by

19References

29Claims

0Family size

Assignee

ROLIC AG · CH

Inventors

Zoubair Cherkaoui · Allschwil, CH
Peggy Studer · Buschwiller, FR
Joachim Reichardt · Weil am Rhein, DE
Hubert Seiberle · Lörrach, DE

Key dates

Filing date	Sep 15, 2006
Grant date	Jun 14, 2011
Priority date	—
Expiry date	Jun 29, 2027

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC09K2323/03
WIPO fieldBasic materials chemistry
WIPO sectorChemistry

Abstract

The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.