Integrated circuit layout pattern for cross-coupled circuits
US7960759B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2008 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | Sep 24, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/519
Abstract
A circuit 32 is provided comprising a first diffusion region 34 and a parallel second diffusion region 36. A sequence of N gate layers 40, 42, 46 is provided with a first and an Nth of these gate layers covering different respective ones of the diffusion regions 34, 36 whilst the middle (N−2) gate layers 42 cover both diffusion regions 34, 36. A bridging conductor 64 connects the first gate layer 40 and the Nth gate layer 46. In some embodiments, the second diffusion region is provided as two second diffusion sub-regions 68, 70 having a diffusion region gap 74 therebetween and electrically connected via a jumper connector 42. A first gate layer 76 which forms a gate electrode with a first diffusion region 66 can extend through this diffusion region gap 74 not forming a gate electrode therewith and facilitating use of a collinear bridging conductor 82 to connect to the Nth gate layer 80.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.