Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
US7962863B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 6, 2008 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | Oct 10, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer are provided. One method includes generating simulated images of the reticle features printed on the wafer using different generated models for a set of different values of exposure conditions. The method also includes determining one or more characteristics of the reticle features of the simulated images. In addition, the method includes comparing the one or more characteristics of the reticle features of the simulated images to one or more characteristics of the reticle features printed on the wafer using a lithography process. The method further includes selecting one of the different generated models as the model to be used for predicting the printability of the reticle features based on results of the comparing step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.