Integrated circuit system with clean surfaces
US7968148B2 · kind B2 · utility
1Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 13, 2007 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | Sep 13, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67075
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An integrated circuit system includes providing an integrated circuit wafer; applying a first cleaning solution over the integrated circuit wafer; and applying a second cleaning solution over the integrated circuit wafer to prevent or remove a defect resulting from the first cleaning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.