Patent · US Active

Integrated circuit system with clean surfaces

US7968148B2 · kind B2 · utility

1Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 13, 2007
Grant dateJun 28, 2011
Priority date
Expiry dateSep 13, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67075
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

An integrated circuit system includes providing an integrated circuit wafer; applying a first cleaning solution over the integrated circuit wafer; and applying a second cleaning solution over the integrated circuit wafer to prevent or remove a defect resulting from the first cleaning process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.