Methods and devices for forming nanostructure monolayers and devices including such monolayers

US7968273B2 · kind B2 · utility

Assignee

• NANOSYS, INC. · US

Inventors

• Jian Chen · San Jose, US
• Xiangfeng Duan · Los Angeles, US
• Chao Liu · San Jose, US
• Madhuri L. Nallabolu · Fremont, US
• J. Wallace Parce · Palo Alto, US
• Srikanth Ranganathan · Mountain View, US

Key dates

• Filing date: Jul 27, 2007
• Grant date: Jun 28, 2011
• Expiry date: Apr 23, 2030

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D84/038
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Methods for forming or patterning nanostructure arrays are provided. The methods involve formation of arrays on coatings comprising nanostructure association groups, formation of arrays in spin-on-dielectrics, solvent annealing after nanostructure deposition, patterning using resist, and/or use of devices that facilitate array formation. Related devices for forming nanostructure arrays are also provided, as are devices including nanostructure arrays (e.g., memory devices). Methods for protecting nanostructures from fusion during high temperature processing are also provided.