Patent · US Active

Method for imprint lithography at constant temperature

US7972553B2 · kind B2 · utility

3Cited by

17References

23Claims

0Family size

Assignee

OBDUCAT AB · SE

Inventors

Marc Beck · Malmö, SE
Babak Heidari · Furulund, SE
Erik Bolmsjö · Malmö, SE
Erik Theander · Lund, SE

Key dates

Filing date	Nov 25, 2004
Grant date	Jul 5, 2011
Priority date	—
Expiry date	Sep 6, 2026

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB29C2059/023
WIPO fieldOther special machines
WIPO sectorMechanical engineering

Abstract

Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.