System and methods of laser assisted field induced oxide nanopatterning
US7976765B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Jul 25, 2008 |
| Grant date | Jul 12, 2011 |
| Priority date | — |
| Expiry date | Nov 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q80/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of forming a nanoscale pattern on a substrate surface. In one embodiment, the method includes the steps of providing a substrate having a surface; providing a nanoscale pattern forming device, comprising an elongated cantilever that has a tip portion proximate an end of the elongated cantilever; and controllably illuminating at least the tip portion of the cantilever with a beam of substantially coherent monoenergetic particles when the cantilever moves relative to the substrate to form a nanoscale pattern on the surface, wherein the tip portion of the cantilever is made from lightly doped silicon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.